Enhanced Nonlinear Refractive Index in ε-Near-Zero Materials
Enhanced Nonlinear Refractive Index in ε-Near-Zero Materials
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DOI：
10.1103/physrevlett.116.233901
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发表时间：
2016-06-08
影响因子：
8.6
通讯作者：
Faccio, D.
中科院分区：
文献类型：
--
作者：
Caspani, L.;Kaipurath, R. P. M.;Faccio, D.
光的新传播机制来自于将介电常数调谐到极低值的能力。在这里，我们展示了一种通用的方法的基础上获得的ε近零（ENZ）制度的非线性折射率，这使得显着的光诱导的材料特性的变化的低线性介电常数值。对Al掺杂的ZnO（AZO）薄膜进行的实验表明，在ENZ波长（位于1300 nm区域）处，克尔非线性折射率（n（2））增加了六倍。这反过来又导致了超快的光致折射率变化的顺序统一，从而代表了一个新的范式非线性光学。
New propagation regimes for light arise from the ability to tune the dielectric permittivity to extremely low values. Here, we demonstrate a universal approach based on the low linear permittivity values attained in the epsilon-near-zero (ENZ) regime for enhancing the nonlinear refractive index, which enables remarkable light-induced changes of the material properties. Experiments performed on Al-doped ZnO (AZO) thin films show a sixfold increase of the Kerr nonlinear refractive index (n(2)) at the ENZ wavelength, located in the 1300 nm region. This in turn leads to ultrafast light-induced refractive index changes of the order of unity, thus representing a new paradigm for nonlinear optics.