Monolayer-Directed Electrodeposition of Oxide Thin Films: Surface Morphology versus Chemical Modification
Monolayer-Directed Electrodeposition of Oxide Thin Films: Surface Morphology versus Chemical Modification
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DOI：
10.1021/jp071290
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发表时间：
2007-08
影响因子：
3.7
通讯作者：
Dinah M. Soolaman;Hua-Zhong Yu
中科院分区：
文献类型：
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作者：
Dinah M. Soolaman;Hua-Zhong Yu
在本文中，我们描述了表面形貌和化学性质在指导电极表面阴极沉积氧化物薄膜方面所起的一般作用。通过使用用于微接触印刷(μCP)的“无特征”印章，可记录光盘(CD-R)金衬底的预刻槽微特征(代表轨道轨迹的“山”和“谷”)可以选择性地用羟基或甲烷封端的自组装单分子层(SAM)进行修饰。为了进行比较，用上述类似于CD-R衬底(但没有高度差异)的平行“微带”上的自组装膜对“扁平”金衬底进行了图案化。氧化锆薄膜的电化学沉积表明，在CD-R衬底上，表面形貌(高度差)主导着自组装膜的阻挡作用；也就是说，尽管这些位置被有机单分子膜修饰，沉积主要发生在山上。对于平坦的金衬底，发现正硫代烷基硫酸酯自组装膜在改性的Ar中阻碍了沉积。
In this paper we describe the general role that surface morphology and chemical nature play in guiding the cathodic deposition of oxide thin films onto electrode surfaces. By use of a “featureless” stamp for microcontact printing (μCP), the pregrooved microfeatures (“mountains” and “valleys” representing the track trails) of recordable compact disc (CD-R) gold substrates can be selectively modified with OH- or CH3-terminated self-assembled monolayers (SAMs). For comparison, “flat” gold substrates were patterned with the above SAMs in parallel “microstrips” that are analogous to the CD-R substrate (but no height differences). Electrochemical deposition of zirconia thin films showed that, on the CD-R substrates, surface morphology (height difference) dominates over the blocking effects of the SAMs; that is, deposition occurred primarily on the mountains despite these sites being modified with organic monolayers. For flat gold substrates it was found that n-alkanethiolate SAMs block deposition in modified ar...