Spark plasma sintering of transparent alumina
Spark plasma sintering of transparent alumina
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DOI：
10.1016/j.scriptamat.2007.06.009
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发表时间：
2007-10-01
影响因子：
6
通讯作者：
Yoshida, Hidehiro
中科院分区：
文献类型：
--
作者：
Kim, Byung-Nam;Hiraga, Keijiro;Yoshida, Hidehiro
通过控制放电等离子体烧结处理过程中的加热速率，获得了具有细粒度（0.27 μ m）的透明氧化铝。在1150 ℃下以8 ℃/min的加热速率烧结的氧化铝具有0.03%的残余孔隙率和对于640 nm波长的47%的在线透射率。我们发现，低的加热速率对氧化铝在1150 ℃下烧结的致密化和透明度有影响。(c)2007 Acta Materialia Inc.由爱思唯尔有限公司出版。保留所有权利。
Transparent alumina with a fine grain size (0.27 mu m) was obtained by controlling the heating rate during spark plasma sintering processing. The alumina sintered at 1150 degrees C with a heating rate of 8 degrees C/min has a residual porosity of 0.03% and an in-line transmission of 47% for a wavelength of 640 nm. We show that a low heating rate has an effect on the densification and transparency of alumina for sintering at 1150 degrees C. (c) 2007 Acta Materialia Inc. Published by Elsevier Ltd. All rights reserved.