Combinatorial Search for Low Resistivity Pd–Cu–Si Thin Film Metallic Glass Compositions
Combinatorial Search for Low Resistivity Pd–Cu–Si Thin Film Metallic Glass Compositions
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DOI：
10.1143/jjap.45.5911
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发表时间：
2006-07
影响因子：
1.5
通讯作者：
Ryusuke Yamauchi;S. Hata;J. Sakurai;A. Shimokohbe
中科院分区：
文献类型：
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作者：
Ryusuke Yamauchi;S. Hata;J. Sakurai;A. Shimokohbe
采用一种新的电弧等离子体沉积薄膜的组合方法——组合电弧等离子体沉积（CAPD），研究了钯铜硅薄膜金属玻璃（tfmg）的低电阻率成分。CAPD装置包括三个电弧等离子枪（apg），每个电弧枪以特定的时间间隔发射脉冲状等离子体Pd、Cu或Si，在SiO2衬底上沉积Pd - Cu - Si薄膜。在本研究中，通过控制注射次数和等离子体强度，沉积了一种基于pd的成分梯度薄膜。将沉积的薄膜分成1089个样品（薄膜库），在不脱离薄膜库的情况下评估每个样品的厚度、成分、相和相对电阻率。从样品中鉴定出三种非晶、低相对电阻率的CAPD样品。为了验证这些样品是金属玻璃，在溅射沉积的样品中重现了它们的成分，并测量了它们的Tg（玻璃转变温度）和Tx（结晶温度）。测量了三种金属玻璃样品的绝对电阻率。结果，Pd81Cu5Si14 at。%样品的最低绝对电阻率为64µΩ·cm，过冷液区温度范围（ΔTx=Tx-Tg）为50 K。该电阻率降低了17%，过冷液体区域几乎是已知pd基TFMG成分的两倍。
A new combinatorial method to deposit thin films using an arc plasma, Combinatorial arc plasma deposition (CAPD), was applied to search for low resistivity compositions of Pd–Cu–Si thin film metallic glasses (TFMGs). The CAPD setup includes three arc plasma guns (APGs), with each gun shooting a pulse-like plasma of Pd, Cu or Si at specific time intervals to deposit a Pd–Cu–Si thin film on an SiO2 substrate. In this study, a Pd-based compositionally-graded thin film was deposited by controlling the number of shots as well as the plasma strength. The deposited thin film was separated into 1,089 samples (thin film library), and the thickness, composition, phase, and relative resistivity of each sample was evaluated without detaching them from the library. From the samples, three amorphous, low relative resistivity CAPD samples were identified. To verify that these samples were metallic glasses, their compositions were reproduced in samples deposited by sputtering, and their Tg (glass transition temperature) and Tx (crystallization temperature) were measured. The absolute resistivities of the three metallic glass samples were also measured. As the result, the Pd81Cu5Si14 at. % sample showed the lowest absolute resistivity of 64 µ Ω ·cm and a supercooled liquid region temperature range ( ΔTx=Tx-Tg) of 50 K. This resistivity is 17% lower and the supercooled liquid region is almost two times larger than those of the known Pd-based TFMG composition.