Valence and conduction band offsets of β-Ga2O3/AlN heterojunction
Valence and conduction band offsets of β-Ga2O3/AlN heterojunction
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DOI:
10.1063/1.5003930
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发表时间:
2017-10
影响因子:
4
通讯作者:
Haiding Sun;C. Castanedo;Kaikai Liu;Kuang-Hui Li;Wenzhe Guo;Ronghui Lin;Xinwei Liu;Jingtao Li-
中科院分区:
文献类型:
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作者:
Haiding Sun;C. Castanedo;Kaikai Liu;Kuang-Hui Li;Wenzhe Guo;Ronghui Lin;Xinwei Liu;Jingtao Li-
Both β-Ga2O3 and wurtzite AlN have wide bandgaps of 4.5–4.9 and 6.1 eV, respectively. We calculated the in-plane lattice mismatch between the (−201) plane of β-Ga2O3 and the (0002) plane of AlN, which was found to be 2.4%. This is the smallest mismatch between β-Ga2O3 and binary III-nitrides which is beneficial for the formation of a high quality β-Ga2O3/AlN heterojunction. However, the valence and conduction band offsets (VBO and CBO) at the β-Ga2O3/AlN heterojunction have not yet been identified. In this study, a very thin (less than 2 nm) β-Ga2O3 layer was deposited on an AlN/sapphire template to form the heterojunction by pulsed laser deposition. High-resolution X-ray photoelectron spectroscopy revealed the core-level (CL) binding energies of Ga 3d and Al 2p with respect to the valence band maximum in individual β-Ga2O3 and AlN layers, respectively. The separation between Ga 3d and Al 2p CLs at the β-Ga2O3/AlN interface was also measured. Eventually, the VBO was found to be −0.55 ± 0.05 eV. Consequent...