Mechanisms of Reduction in Hole Concentration in Al-Implanted p-type 6H-SiC by 1 MeV Electron Irradiation

Mechanisms of Reduction in Hole Concentration in Al-Implanted p-type 6H-SiC by 1 MeV Electron Irradiation
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1 MeV电子辐照降低Al注入p型6H-SiC空穴浓度的机制

DOI:
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发表时间:
2008
期刊:
Japanese Journal of Applied Physice (in press)
影响因子:
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通讯作者:
and T.Ohshima
and T.Ohshima
中科院分区:
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文献类型:
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作者:
H.Matsuura;K.Izawa;N.Minohara;and T.Ohshima

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