High-temperature oxidation behaviors of CVD diamond films
High-temperature oxidation behaviors of CVD diamond films
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DOI：
10.1016/j.apsusc.2009.08.042
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发表时间：
2009-11
影响因子：
6.7
通讯作者：
Jui-Chen Pu;Sea-Fue Wang;J. Sung
中科院分区：
文献类型：
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作者：
Jui-Chen Pu;Sea-Fue Wang;J. Sung
本研究利用热分析和高温原位拉曼光谱分析对高温氧化的单晶金刚石和热灯丝化学气相沉积（HF-CVD）法制备的金刚石薄膜进行了表征。测量在空气和N2气氛中在高达1300°C的各种温度下进行。结果表明，在700°C沉积的金刚石膜（D700膜）的初始氧化温度为629°C，低于在900°C沉积的金刚石膜（D900膜，650°C）和单晶金刚石（674°C）在空气中的初始氧化温度。D700膜在高温下的氧化速率似乎是所研究的样品中最高的。一个可能的原因在于，与D900样品相比，D700金刚石薄膜含有大量的非金刚石碳和晶界。而D900和D700金刚石薄膜以及单晶金刚石在N2气氛中加热到1300°C时没有出现可检测到的失重和氧化。
In this study, high-temperature oxidation of single-crystal diamond and diamond films prepared by hot filament chemical vapor deposition (HF-CVD), were characterized using thermal analysis and high-temperature in-situ Raman analysis. The measurements were performed in various temperatures up to 1300°C in air and N2atmospheres. The results indicate that the initial oxidization temperature of diamond film deposited at 700°C (D700 film) is ≈629°C, lower than those of diamond film deposited at 900°C (D900 film, ≈650°C) and single-crystalline diamond (≈674°C) in air. Oxidation rate of D700 film at high temperatures appeared to be the highest among the samples studied. A likely cause lies in the fact that, compared to their D900 sample, D700 diamond film contains a larger amount of non-diamond carbon and grain boundaries. However, D900 and D700 diamond films as well as single-crystalline diamond showed no detectable weight loss and oxidization when they were heated up to 1300°C in N2atmosphere.