A 1:1 electron stepper
A 1:1 electron stepper
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1:1 电子步进机
DOI：
10.1116/1.584549
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发表时间：
1989
影响因子：
1.4
通讯作者：
V. Kolarik
中科院分区：
文献类型：
--
作者：
A. Delong;V. Kolarik
提出了一种设计1:1电子步进器的新方法。采用金属-绝缘体-金属（MIM）阴极代替光电阴极。MIM阴极的电子发射机制与光电发射机制明显不同。在MIM阴极中，来自母材金属层的电子穿过薄介质层，在介质层中产生一个强电场（约7×108 V m−1），进入外层薄金属层。那些在电介质和外层薄金属层（克服外层金属层的功函数势垒）中散射后仍有足够能量的电子将逃逸到真空中。与光发射相比，所描述的机制在电子投影光刻中有一些优势。例如，发射电流密度为10−4 A cm−2；阴极可以根据掩模的图像而独立于方向标记轻松快速地接通和关闭；最后，poss…
A new approach to the design of a 1:1 electron stepper has been suggested. A metal‐insulator–metal (MIM) cathode is used in place of the photoemission one. The mechanism of the electron emission from the MIM cathode is markedly different from that of photoemission. In the MIM cathode the electrons from the base metal layer move through the thin dielectric layer, in which a strong electric field is generated (about 7×108 V m−1), into the outer thin metal layer. Those electrons that have enough energy remaining after scattering in the dielectric and outer thin metal layer (to overcome the work function barrier of the outer metal layer) will escape into the vacuum. Compared to photoemission, the described mechanism has some advantages if considered for use in electron projection lithography. For example, an emission current density of the order of 10−4 A cm−2; the cathode can be easily and quickly switched on and off with the image of the mask and independently of the orientation marks; and finally, the poss...