Selective dissolution of the γ phase in a binary Ni(γ)/Ni3Al(γ′) two-phase alloy
Selective dissolution of the γ phase in a binary Ni(γ)/Ni3Al(γ′) two-phase alloy
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DOI：
10.1016/j.corsci.2010.07.036
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发表时间：
2010-11
影响因子：
8.3
通讯作者：
H. Lee;M. Demura;Ya Xu;D. Wee;T. Hirano
中科院分区：
文献类型：
--
作者：
H. Lee;M. Demura;Ya Xu;D. Wee;T. Hirano
研究了Ni（γ）在含1wt的双相Ni(γ)/Ni3Al（γ’）合金中的选择性溶解。% (NH4) 2so4和1wt。柠檬酸，得到一个粗糙的，γ '端表面。通过γ和γ′单相合金的极化曲线测定了选择性溶解的电化学电位。选择性溶解试验证明，γ在1.7VSCE以上被精确去除，导致形成粗糙的γ终止表面。表面分析表明，钝化的AlOx优先在γ′上形成，从而延缓了溶解，导致了成功的选择性溶解。
Selective dissolution of Ni(γ) in a binary Ni(γ)/Ni3Al(γ′) two-phase alloy was performed in an aqueous electrolyte including 1wt.% (NH4)2SO4and 1wt.% citric acid to obtain a rough, γ′-terminated surface. The electrochemical potential for the selective dissolution was determined from the polarization curves of the γ and γ′ single-phase alloys. The selective dissolution tests proved that γ was precisely removed above 1.7VSCE, resulting in the formation of a rough, γ′-terminated surface. Surface analyses revealed that a passive AlOx, which retarded the dissolution, was preferentially formed on γ′, resulting in a successful selective dissolution.