Clean and Ni-adsorbed Si(110) surfaces
Clean and Ni-adsorbed Si(110) surfaces
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清洁且吸附 Ni 的 Si(110) 表面
DOI：
10.1016/0169-4332(93)90720-v
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发表时间：
1993
影响因子：
6.7
通讯作者：
G. Shimaoka
中科院分区：
文献类型：
--
作者：
G. Shimaoka
用RMEED、LEED和XPS研究了清洁和Ni吸附Si（110）表面的结构和组成，并与最近报道的结果进行了比较。清洁且定向良好的表面由倾斜的“16 X 2”超结构组成，其尺寸为：沿着<17，17，2>轴的16倍长和沿沿着轴的2倍长<112>，双畴平行于<112>基质晶胞的轴，并且沿沿着方向具有高度有序的原子排列<112><110>。Ni吸附的Si（110）表面表现出2 × 1和4 × 5的超结构，并随退火温度和时间的变化而发生可逆相变。角分辨XPS深度剖面分析表明，这些结构的Ni原子主要位于表面水平以下约20 μ m的深度，表明重建是密切相关的热处理后的表面区域中的Ni含量。
The structure and composition of clean and Ni-adsorbed Si(110) surfaces were studied by RMEED, LEED and XPS, and the results were discussed in comparison with those recently reported by other investigators. The clean and well-oriented surface consists of an oblique “16 X 2” superstructure with dimensions: 16 times long along the <17,17,2> axis and 2 times long along the <112> axis, with double domains parallel to the <112> axis of the matrix unit cell, and with highly ordered atomic arrangement along the <112> and <110> directions. Ni-adsorbed Si(110) surfaces showed the 2 × 1 and the 4 × 5 superstructures with reversible phase transition depending on the temperature and the time of annealing. Depth profile analysis by angle-resolved XPS showed that Ni atoms contributing to these structures were mostly located at a depth of about 20 Å below the surface level, indicating that the reconstruction is closely related to the Ni content in the surface region after the heat treatment.