Optical Transverse Injection in Laser-Plasma Acceleration
Optical Transverse Injection in Laser-Plasma Acceleration
复制标题
DOI：
10.1103/physrevlett.111.085005
复制
发表时间：
2013-08-23
影响因子：
8.6
通讯作者：
Malka, V.
中科院分区：
文献类型：
--
作者：
Lehe, R.;Lifschitz, A. F.;Malka, V.
激光尾场加速是未来电子加速器一项有前途的技术。这种加速器的关键步骤是将电子注入尾场，这将在很大程度上决定提取光束的特性。我们在这里提出了一种新的碰撞脉冲注入范例，它使我们能够生成具有极低发射率（0：17 mm . mrad）和低能量扩散（2%）的高质量电子束，同时保留高电荷（类似于 100 pC）和短持续时间（3 fs）。在这种范例中，脉冲碰撞引起加速气泡的瞬时膨胀，然后导致横向电子注入。这种机制与之前观察到的光学注入机制形成鲜明对比，后者基本上是纵向的。我们还指定了这种新型注射发生的参数范围，并表明它在现有高强度激光设施的范围内。
Laser-wakefield acceleration constitutes a promising technology for future electron accelerators. A crucial step in such an accelerator is the injection of electrons into the wakefield, which will largely determine the properties of the extracted beam. We present here a new paradigm of colliding-pulse injection, which allows us to generate high-quality electron bunches having both a very low emittance (0: 17 mm . mrad) and a low energy spread (2%), while retaining a high charge (similar to 100 pC) and a short duration (3 fs). In this paradigm, the pulse collision provokes a transient expansion of the accelerating bubble, which then leads to transverse electron injection. This mechanism contrasts with previously observed optical injection mechanisms, which were essentially longitudinal. We also specify the range of parameters in which this new type of injection occurs and show that it is within reach of existing high-intensity laser facilities.