Void Engineering in Silica Glass for Ultralow Optical Scattering Loss
Void Engineering in Silica Glass for Ultralow Optical Scattering Loss
复制标题
二氧化硅玻璃中的空隙工程可实现超低光学散射损耗
DOI：
10.1109/jlt.2021.3089171
复制
发表时间：
2021
影响因子：
4.7
通讯作者：
Ono Madoka
中科院分区：
文献类型：
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作者：
上殿明良，田中亮，高島信也，上野勝典，江戸雅晴，嶋紘平，小島一信，秩父重英，石橋章司;荒木努，後藤直樹，出浦桃子， 黒田悠弥，和田邑一，藤井高 志，毛利真一郎，白石裕児，福 田承生;Ono Madoka
石英玻璃光纤中的光损耗在其应用中仍然是一个挑战。光衰减的主要贡献者是瑞利散射。本文综述了石英玻璃中的空穴及其对光学损耗的影响的最新研究成果。通过在熔融温度下对玻璃进行压力淬火的实验研究，空隙尺寸缩小，并且在0.2GPa下光学损耗降低到常规光纤的大约一半。我们的建模结果预测，在高达4 GPa的高压缩压力下，预计会进一步减少，这归功于玻璃网络的优化，称为拓扑修剪。
Optical losses in silica glass fibers remain a challenge in their applications. The main contributor to optical attenuation is Rayleigh scattering. This review discusses the recent studies and findings on voids in silica glass and their effects on the optical loss. Through experimental studies of pressure-quenching on glass at the melting temperature, void size shrunk, and the optical loss was reduced to approximately half of that of conventional optical fibers at 0.2 GPa. Our modeling results predicted that further reduction was expected, credited to the optimization of the glass network, called topological pruning, under high compressive pressures of up to 4 GPa.