Effect of silicate on passive films anodically formed on iron in alkaline solution as studied by electrochemical impedance spectroscopy
Effect of silicate on passive films anodically formed on iron in alkaline solution as studied by electrochemical impedance spectroscopy
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DOI：
10.5006/1.3283960
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发表时间：
1999-01-01
期刊：
影响因子：
1.6
通讯作者：
Muller, IL
中科院分区：
文献类型：
--
作者：
Amaral, ST;Muller, IL
在0.01 mol/L氢氧化钠（NaOH）+ x ppm二氧化硅（SiO2）（x = 250、500和750 ppm）中，在300 mV（SCE）极化的铁圆盘电极上进行电化学阻抗谱（EIS）研究，以确定硅酸盐对碱性溶液中铁阳极形成的钝化膜的影响。电化学阻抗谱（EIS）表明，硅酸盐的加入增加了薄膜电阻（R-f），降低了薄膜电容（C），并影响了界面电化学反应动力学，导致电荷转移电阻（R-t）的增加，这与硅酸盐的浓度和极化时间有关。
Studies using electrochemical impedance spectroscopy (EIS) were carried out on an iron disk electrode in 0.01 mol/L sodium hydroxide (NaOH) + x ppm silica (SiO2) (x = 250, 500, and 750 ppm) polarized at 300 mV(SCE) to determine the effect of silicate on passive films anodically formed on iron in alkaline solutions. EIS proved silicate increased film resistance (R-f), decreased its capacitance (C), and affected the kinetics of interfacial electrochemical reactions, leading to an increase in the charge-transfer resistance (R-t), which depended upon silicate concentration and polarization time.