Base-Sensitive Polymers as Imaging Materials: Radiation-Induced β-Elimination To Yield Poly(4-hydroxystyrene)
Base-Sensitive Polymers as Imaging Materials: Radiation-Induced β-Elimination To Yield Poly(4-hydroxystyrene)
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作为成像材料的碱敏聚合物：辐射诱导 β-消除以产生聚（4-羟基苯乙烯）
DOI：
10.1021/ma961446w
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发表时间：
1997
期刊：
影响因子：
5.5
通讯作者：
J. Fréchet
中科院分区：
文献类型：
--
作者：
E. Urankar;I. Brehm;Q. Niu;J. Fréchet
报道了一类新的功能化聚苯乙烯，它们对碱催化β-消除很敏感。对聚[（（（（（2-氰-1,1-二甲基乙基）氧基）羰基）氧基）苯乙烯]、聚[（（2-氰乙氧基）羰基）氧基）苯乙烯]和聚[((（（2-甲基磺酰基）乙氧基（羰基）氧基）苯乙烯]的热行为的研究证实，它们在一个易受碱催化作用的过程中容易定量地消除其侧链基团。利用新型的4,4′-[双[[（2-硝基苯基）氧]羰基]三亚甲基]双哌替啶作为胺光发生器完成了这些聚合物体系的成像。将((（（2-氰基-1,1-二甲基乙基（氧）羰基）氧）苯乙烯和（（丁氧羰基）氧）苯乙烯共聚，然后用酸选择性地脱保护t-BOC保护基团，合成了含有游离酚单元的碱敏感共聚物，具有增强的薄膜性能。
A novel family of functionalized polystyrenes that are susceptible to base-catalyzed β-elimination is reported. A study of the thermal behaviors of poly[(((((2-cyano-1,1-dimethylethyl)oxy)carbonyl)oxy)styrene], poly[(((2-cyanoethoxy)carbonyl)oxy)styrene], and poly[((((2-methylsulfonyl)ethoxy)carbonyl)oxy)styrene] confirms that they undergo facile and quantitative elimination of their side chain groups in a process that is susceptible to base catalysis. Imaging of these polymer systems was accomplished using the novel ,4,4‘-[bis[[(2-nitrobenzyl)oxy]carbonyl]trimethylene]dipiperidine as an amine photogenerator. Copolymerization of ((((2-cyano-1,1-dimethylethyl)oxy)carbonyl)oxy)styrene and ((t-butoxycarbonyl)oxy)styrene followed by selective deprotection of the t-BOC protecting groups with acid enabled the synthesis of a base-sensitive copolymer containing free phenol units with enhanced thin-film properties.