CO Intercalation of Graphene on Ir(111) in the Millibar Regime
CO Intercalation of Graphene on Ir(111) in the Millibar Regime
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DOI：
10.1021/jp4043045
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发表时间：
2013-08-15
影响因子：
3.7
通讯作者：
Knudsen, Jan
中科院分区：
文献类型：
--
作者：
Granas, Elin;Andersen, Mie;Knudsen, Jan
在这里，我们表明，它是可能的插入CO下的石墨烯生长在Ir（111）已经在室温下，当CO的压力在毫巴制度使用。从X射线光电子能谱和扫描隧道显微镜的相互作用，我们得出结论，插层CO吸附结构类似于（3根3 X 3根3）R30度）吸附结构，其在暴露于类似于1毫巴的CO时形成在Ir（111）上。此外，密度泛函理论计算表明，CO插层石墨烯的结构和电子性质与p掺杂的独立石墨烯相似。最后，我们表征了我们总是在CO插层石墨烯中观察到的非插层条纹和岛屿。我们观察到这些nonintercalated地区主要在HCP和FCC地区附近的步骤边缘，并建议在石墨烯中的应力释放是其形成的驱动力，而在HCP和FCC地区的弱化学键的原因，其区域选择性。
Here we show that it is possible to intercalate CO under graphene grown on Ir(111) already at room temperature when CO pressures in the millibar regime are used. From the interplay of X-ray photoelectron spectroscopy and scanning tunneling microscopy we conclude that the intercalated CO adsorption structure is similar to the (3 root 3 X 3 root 3)R30 degrees) adsorption structure that is formed on Ir(111) upon exposure to similar to 1 mbar of CO. Further, density functional theory calculations reveal that the structural and electronic properties of CO-intercalated graphene are similar to p-doped freestanding graphene. Finally we characterize nonintercalated stripes and islands that we always observe in the CO-intercalated graphene. We observe these nonintercalated areas predominately in HCP and FCC areas near step edges and suggest that stress release in graphene is the driving force for their formation, while the weak chemical bonds in HCP and FCC areas are the reason for their area selectivity.