Direct top-down ordering of diblock copolymers trough nanoimprint lithography
Direct top-down ordering of diblock copolymers trough nanoimprint lithography
复制标题
通过纳米压印光刻直接自上而下排序二嵌段共聚物
DOI：
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发表时间：
2011
期刊：
影响因子：
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通讯作者：
M. Zelsmann
中科院分区：
文献类型：
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作者：
M. Salaun;N. Kehagias;B. Salhi;T. Baron;J. Boussey;C. Torres;M. Zelsmann
在这项工作中，热纳米压印光刻（NIL）是用在全8英寸。硅晶片以压印薄的PS-b-PMMA嵌段共聚物（BCP）层。作者表明，压印BCP层可以在NIL过程之后或在NIL过程本身期间热自组织，这取决于所使用的实验条件。具有良好的图形外延对准的自组织压印功能获得与圆柱形BCP。然而，标准的氟化硅烷模具处理显示对BCP不是中性的。然后，如果线特征不具有可精确地与聚合物10的自然自组织周期相匹配的厚度，则观察到表面润湿层。
In this work, thermal nanoimprint lithography (NIL) is used on full 8 in. silicon wafers to imprint a thin PS-b-PMMA block copolymer (BCP) layer. The authors show that the imprinted BCP layer can thermally self-organize after the NIL process or during the NIL process itself, depending on experimental conditions used. Self-organized imprinted features with good graphoepitaxy alignment are obtained with a cylindrical BCP. Nevertheless, a standard fluorinated silane mold treatment is shown not to be neutral to the BCP. Then, if the line features do not have a thickness exactly commensurable to the natural self-organizing period of the polymer l0, a surface wetting layer is observed.