Effects of sputtering current on the bonding structure and mechanical properties of diamond‐like carbon films deposited by MFPUMST
Effects of sputtering current on the bonding structure and mechanical properties of diamond‐like carbon films deposited by MFPUMST
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DOI：
10.1002/sia.3060
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发表时间：
2009-07
影响因子：
1.7
通讯作者：
H. Dai;Hui Jiang;Changyong Zhan;N. Huang
中科院分区：
文献类型：
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作者：
H. Dai;Hui Jiang;Changyong Zhan;N. Huang
采用中频脉冲非平衡磁控溅射技术（MFPUMST）在不同溅射电流下在玻璃基片上制备类金刚石（DLC）薄膜。拉曼光谱和X射线光电子能谱（XPS）表征的碳化学键表明，DLC膜中的sp3分数随着溅射电流从100 mA增加到300 mA而增加，然后在300 mA以上减少。通过纳米压痕技术分析这些薄膜在不同溅射电流下的机械性能，如纳米硬度和弹性恢复，显示出相同的趋势，即纳米硬度和弹性恢复随着溅射电流从100 mA增加到300 mA而增加，然后随着溅射电流从300 mA增加到400 mA而降低。这些结果表明，所制备的DLC膜中的sp3分数与纳米硬度和弹性恢复直接相关。上述结果表明，溅射电流参数对沉积的DLC膜的成键结构有很大的影响。本文讨论了溅射电流对sp3组分的影响机制。版权所有© 2009约翰威利父子有限公司。
Diamond‐like carbon (DLC) films on glass wafers were produced by middle frequency pulsed unbalanced magnetron sputtering technique (MFPUMST) at different sputtering current. The chemical bonding of carbon characterized by Raman spectroscopy and X‐ray photoelectron spectroscopy (XPS) show that the sp3 fraction in DLC films increases with increasing sputtering current from 100 to 300 mA, and then decreases above 300 mA. Mechanical properties like nano‐hardness and elastic recovery for these films under different sputtering currents analyzed by a nano‐indentation technique show the same tendency that nano‐hardness and elastic recovery increase with increasing sputtering current from 100 to 300 mA, and then decrease with increasing sputtering current from 300 to 400 mA. These results indicate that the sp3 fraction in the prepared DLC films is directly related to nano‐hardness and elastic recovery. The results shown above indicate that the parameter of the preparation—sputtering current has a strong influence on the bonding configuration of the deposited DLC films. The mechanism of sputtering current on the sp3 fraction is discussed in this paper. Copyright © 2009 John Wiley & Sons, Ltd.