Shape memory behavior of Ni-Mn-Ga sputtered films under a magnetic field
Shape memory behavior of Ni-Mn-Ga sputtered films under a magnetic field
复制标题
DOI：
10.2320/matertrans.44.2513
复制
发表时间：
2003-12-01
影响因子：
1.2
通讯作者：
Itagaki, K
中科院分区：
文献类型：
--
作者：
Ohtsuka, M;Sanada, M;Itagaki, K
Ni-Mn-Ga溅射薄膜在高达5 T的磁场下具有形状记忆行为。溅射膜进行热处理，在1073 K为36 ks的均匀化和老化在673 K为14.4和56.7 ks的约束条件。薄膜的马氏体相变温度和居里温度均高于室温。磁场作用下马氏体相变温度升高。此外，通过增加和减少磁场观察到形状记忆效应。
The shape memory behavior under the magnetic field up to 5 T was observed in Ni-Mn-Ga sputtered films. The sputtered films were heat-treated at 1073 K for 36 ks for homogenization and aged at 673 K for 14.4 and 56.7 ks in a constraint condition. The martensitic transformation temperatures and Curie temperature of the obtained films were higher than room temperature. The martensitic transformation temperatures increased under a magnetic field. Furthermore, a shape memory effect was observed by increasing and decreasing of the magnetic field.