Perpendicular domain orientation in thin films of polystyrene - Polylactide diblock copolymers
Perpendicular domain orientation in thin films of polystyrene - Polylactide diblock copolymers
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DOI：
10.1021/ma0509006
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发表时间：
2005-11-29
期刊：
影响因子：
5.5
通讯作者：
Hillmyer, MA
中科院分区：
文献类型：
--
作者：
Olayo-Valles, R;Guo, SW;Hillmyer, MA
嵌段共聚物薄膜是理想的模板，广泛的技术，其中需要大面积的纳米级特征的图案。为此目的使用层状和圆柱形形成嵌段共聚物的主要挑战之一是诱导嵌段共聚物域垂直于膜表面取向。我们在这里表明，垂直域取向可以很容易地实现与聚苯乙烯-b-聚乳酸（PS-PLA）薄膜。通过在各种基底上旋涂，然后热退火，制备了可形成凝胶的PS-PLA膜。改变分子量、膜厚度、退火温度和退火时间。当薄膜厚度大于本体形态的重复间距时，畴的取向与表面垂直，与基底/薄膜界面无关。然后，该薄膜用于制备纳米多孔模板的组合的水解聚乳酸降解和氧反应离子蚀刻（O-2-RIE）。然后使用CF 4-RIE将模板图案转移到衬底上以形成纳米级凹坑阵列。
Block copolymer thin films are ideal templates for a wide range of technologies where large area patterns of nanoscale features are desired. One of the main challenges in using lamellae- and cylinder-forming block copolymers for this purpose is to induce the block copolymer domains to orient perpendicular to the film surface. We here show that perpendicular domain orientation can be easily achieved with polystyrene-b-polylactide (PS-PLA) thin films. Cylinder-forming PS-PLA films were prepared by spin-coating on a variety of substrates followed by thermal annealing. The molecular weight, film thickness, annealing temperature, and annealing time were varied. When the film thickness was larger than the repeat spacing of the bulk morphology, the domains oriented perpendicular to the surface independent of the substrate/film interface. The films were then used to prepare nanoporous templates by a combination of hydrolytic PLA degradation and oxygen reactive ion etching (O-2-RIE). The template pattern was then transferred to the substrate using CF4-RIE to form an array of nanoscale pits.