Electrospray Deposition of Diamond Nanoparticle Nucleation Layers for Subsequent CVD Diamond Growth
Electrospray Deposition of Diamond Nanoparticle Nucleation Layers for Subsequent CVD Diamond Growth
复制标题
DOI：
10.1557/proc-1203-j17-27
复制
发表时间：
2009
期刊：
影响因子：
--
通讯作者：
O. Fox;J. Holloway;G. Fuge;P. May;M. Ashfold
中科院分区：
文献类型：
--
作者：
O. Fox;J. Holloway;G. Fuge;P. May;M. Ashfold
成核是大多数化学气相沉积工艺初始阶段的速率决定步骤。为了实现金刚石薄膜的均匀沉积，需要在非金刚石衬底上播种。在这里，我们讨论了一个简单的电喷雾沉积技术的应用5纳米金刚石种子颗粒到各种尺寸的基板上。所选参数的影响，如实验空间布置和胶体性质，分析优化的方法，通过光学和电子显微镜，之前和之后的纳米晶金刚石沉积在种子层。电喷雾方法的优点和局限性突出了其他常用的成核技术。
Nucleation is the rate-determining step in the initial stages of most chemical vapour deposition processes. In order to achieve uniform deposition of diamond thin films it is necessary to seed non-diamond substrates. Here we discuss a simple electrospray deposition technique for application of 5 nm diamond seed particles onto substrates of various sizes. The influence of selected parameters, such as experimental spatial arrangement and colloidal properties, are analysed in optimizing the method by optical and electron microscopy, both before and after nanocrystalline diamond deposition on the seed layer. The advantages and limitations of the electrospray method are highlighted in relation to other commonly exploited nucleation techniques.