Low-loss polysilicon subwavelength grating waveguides and narrowband Bragg reflectors in bulk CMOS
Low-loss polysilicon subwavelength grating waveguides and narrowband Bragg reflectors in bulk CMOS
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DOI:
10.1364/oe.381894
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发表时间:
2020-03-16
期刊:
影响因子:
3.8
通讯作者:
Lee, San-Liang
中科院分区:
文献类型:
--
作者:
Hung, Yung-, Jr.;Tang, Cheng-Tse;Lee, San-Liang
The performance of a photonic functional device in bulk CMOS has been limited by the high propagation loss in polysilicon strip waveguide. Based on the zero-process-change methodology, we successfully reduce the propagation loss of polysilicon waveguide from 112 dB/cm to only 38 dB/cm by solely engineering the waveguide geometry for the first time. Low propagation loss is attributed to a significantly reduced optical overlap factor of 0.09 to bulk polysilicon using subwavelength grating (SWG) waveguide design. These findings prompt us to demonstrate a narrowband SWG-based cladding-modulated Bragg reflector in bulk CMOS, which provides a full-width at half maximum (FWHM) of 1.63 nm, an extinction ratio of 24.5 dB, and a reduced temperature sensitivity of 27.3 pm/degrees C. Further reducing the FWHM to 0.848 nm is also achieved by decreasing the grating coupling strength. We believe the achievements made in this work validate a promising design path towards practical photonic-electronic applications in bulk CMOS. (C) 2020 Optical Society of America under the terms of the OSA Open Access Publishing Agreement