Process Variation Model and Analysis for Domain Wall-Magnetic Tunnel Junction Logic
Process Variation Model and Analysis for Domain Wall-Magnetic Tunnel Junction Logic
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DOI:
10.1109/iscas45731.2020.9180675
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发表时间:
2020-10
期刊:
影响因子:
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通讯作者:
Xuan Hu;Alexander J. Edwards;T. Xiao;C. Bennett;J. Incorvia;M. Marinella;J. Friedman
中科院分区:
文献类型:
--
作者:
Xuan Hu;Alexander J. Edwards;T. Xiao;C. Bennett;J. Incorvia;M. Marinella;J. Friedman
The domain wall-magnetic tunnel junction (DW-MTJ) is a spintronic device that enables efficient logic circuit design because of its low energy consumption, small size, and non-volatility. Furthermore, the DW-MTJ is one of the few spintronic devices for which a direct cascading mechanism is experimentally demonstrated without any extra buffers; this enables potential design and fabrication of a large-scale DW-MTJ logic system. However, DW-MTJ logic relies on the conversion between electrical signals and magnetic states which is sensitive to process imperfection. Therefore, it is important to analyze the robustness of such DW-MTJ devices to anticipate the system reliability before fabrication. Here we propose a new DW-MTJ model that integrates the impacts of process variation to enable the analysis and optimization of DW-MTJ logic. This will allow circuit and device design that enhances the robustness of DW-MTJ logic and advances the development of energy-efficient spintronic computing systems.