A high performance trench gate tunneling field effect transistor based on quasi-broken gap energy band alignment heterojunction
A high performance trench gate tunneling field effect transistor based on quasi-broken gap energy band alignment heterojunction
复制标题
基于准断隙能带排列异质结的高性能沟槽栅隧道场效应晶体管
DOI:
10.1088/1361-6528/ac56b9
复制
发表时间:
2022-05-28
期刊:
影响因子:
3.5
通讯作者:
Zhang, Hao
中科院分区:
文献类型:
--
作者:
Chen, Shupeng;Wang, Shulong;Zhang, Hao
In this letter, a tunneling field effect transistor based on quasi-broken gap energy band alignment (QB-TFET) is proposed and investigated by simulation method. To offering high on-state current, InGaAs/GaAsSb heterojunction with quasi-broken gap energy band alignment is applied to QB-TFET to improve the band-to-band tunneling rate. Trench gate structure and InGaAs pocket layer are applied to further increase the tunneling efficiency. To suppress the leakage current caused by the off-state tunneling path from source to drain, an intrinsic InGaAs spacer is inserted between n+ InGaAs drain and p+ GaAsSb source. In order to further improve the control ability of gate voltage on channel, TiO2 is used as the gate dielectric of the proposed QB-TFET. Moreover, the effect of x and y fraction of In (x) Ga1-x As and GaAs (y) Sb1-y on quasi-broken gap tunneling junction are studied in this work. The electrical characteristic change of QB-TFET with different x and y fraction is analyzed. The proposed QB-TFET is compared with other works and shows an obvious advantage on performance. As a result, a large on-state current (I (on)) of 921 mu A mu m(-1) can be obtained. Moreover, steep average subthreshold swing (SSavg) of 4.9 mV/dec can be achieved when I (on) = 1 mu A mu m(-1).