Photoelectron Spectroscopy of Practical Electrode Materials
Photoelectron Spectroscopy of Practical Electrode Materials
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实用电极材料的光电子能谱
DOI：
10.1002/9783527616756.ch2
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发表时间：
1990
期刊：
影响因子：
--
通讯作者：
R. Kötz
中科院分区：
文献类型：
--
作者：
R. Kötz
在过去的10到15年里，表面灵敏光谱技术在电化学中得到越来越多的接受。这一发展很好地反映了一系列会议的贡献，致力于“非传统”的固体/电解质界面的研究，在La Colle-sur-Loup 1977 [11]，Snowmass 1979 [a]，Logan 1982 [3]和柏林1986 [4]。在总结“电极电解质界面的电子和分子结构”会议上，E。耶格尔已经给出了可用的原位和非原位技术[5]的概述，由表面科学家的电化学家采用。用于化学分析的电子能谱（ESCA）或X射线光电子能谱（XPS，这一章将全部称为XPS）必须被视为电化学界面研究的非原位技术。至少从Siegbahn [6]和他的同事获得1981年诺贝尔奖以来，XPS已经发展成为一种标准的表面分析技术。XPS的发展与光电子能谱（PS）的发展密切相关，必须为可靠的超高真空（UHV）控制提供理论背景和实验设备。当记住特高压控制直到20世纪50年代末才实现，并且通过三步模型的建议，为PS创建理论背景的重要一步发生在20世纪60年代初时，PS和表面科学的快速发展就可以想象出来[7]。吸附在表面上的气体的可靠光谱仅在1970年左右获得。斯派塞[S]和Feuerbacher等人对PS的历史作了很好的概述。[IS]。鉴于PS在表面科学中的巨大成功，XPS很早就被用于电化学修饰电极表面的研究也就不足为奇了。Winograd等人[1&12]是第一个使用这种光谱学来研究Pt电极上的氧化物形成，也用于研究Pt上的金属欠电位沉积（UPD）。虽然XPS是一种标准的表面分析工具，但在电化学中尚未发现相应的考虑因素。
Surface sensitive spectroscopic techniques have found increasing acceptance in electrochemistry during the last ten to fifteen years. This development is nicely reflected by the contributions to a series of conferences devoted to “non traditional” studies of the solid/electrolyte interface held in La Colle-sur-Loup 1977 [11, Snowmass 1979 [a], Logan 1982 [3] and Berlin 1986 [4]. In summarizing the conference on “Electronic and Molecular Structure of Electrode Electrolyte Interface” E. Yeager has given an overview of available in situ and ex situ techniques [5] adopted by electrochemists from surface scientists. Electron spectroscopy for chemical analysis (ESCA) or X-ray photoelectron spectroscopy (XPS as it will be called throughout this chapter) has to be regarded as an ex situ technique for electrochemical interface studies. At least since the contribution of Siegbahn [6] and his coworkers, which were awarded with the Nobel Prize in 1981, XPS was developed into a standard surface analytical technique.The development of XPS is tightly bound to the development of photoelectron spectroscopy (PS) in general, for which the theoretical background and the experimental facilities for reliable ultra high vacuum (UHV) control had to be provided. The rapid development of PS and surface science can be visualized when keeping in mind that UHV control was only achieved in the late 1950’s and that a major step in creating a theoretical background for PS occurred in the early 1960’s by the suggestion of the three step model [7]. Reliable spectra of gases adsorbed on surfaces were only obtained around 1970. Excellent overviews of the history of PS are given by Spicer [S] and by Feuerbacher et al.[IS]. In view of the overwhelming success of PS in surface science, it is not surprising that XPS has been used rather early for the study of electrochemically modified electrode surfaces. Winograd et al.[1&12] were the first to use this spectroscopy for the study of oxide formation on Pt electrodes and also for the investigation of metal underpotential deposition (UPD) on Pt. Although a standard surface analytical tool, XPS has not found a corresponding consideration in electrochemistry.