Arbitrary photo-patterning in liquid crystal alignments using DMD based lithography system
Arbitrary photo-patterning in liquid crystal alignments using DMD based lithography system
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DOI：
10.1364/oe.20.016684
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发表时间：
2012-07-16
期刊：
影响因子：
3.8
通讯作者：
Lu, Yan-qing
中科院分区：
文献类型：
--
作者：
Wu, Hao;Hu, Wei;Lu, Yan-qing
我们提出并实现了一种在液晶(LC)对准和局部偏振控制光波前中制作任意图案的技术。一种以数字微镜器件为动态掩模的微光刻系统，在光取向层上形成任意的显微图像，并进一步引导LC分子的取向。除了普通的位相光栅，还展示了更复杂的二维图案，如准晶和棋盘结构。为了表征所制作结构的光学性能，在几种一维/二维位相光栅中演示了电光可调谐的衍射图和效率。与其他技术相比，我们的方法可以实现对液晶排列和光偏振态的任意和即时操作，从而促进了在显示和光子领域的广泛应用。(C)2012年美国光学学会
We propose and implement a technique for arbitrary pattern fabrication in liquid crystal (LC) alignments and local polarization control for light wavefront. A micro-lithography system with a digital micro-mirror device as dynamic mask forms arbitrary micro-images on photoalignment layers and further guides the LC molecule orientations. Besides normal phase gratings, more complex 2D patterns such as quasicrystal and checkerboard structures are demonstrated. To characterize the optical performances of the fabricated structures, the electro-optically tunable diffraction patterns and efficiencies are demonstrated in several 1D/2D phase gratings. Compared to other techniques, our method enables the arbitrary and instant manipulation of LC alignments and light polarization states, facilitating wide applications in display and photonic fields. (C) 2012 Optical Society of America