Analysis of three dimentional interface cracking in electronic packages
Analysis of three dimentional interface cracking in electronic packages
复制标题
电子封装三维界面裂纹分析
DOI:
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发表时间:
2013
期刊:
影响因子:
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通讯作者:
H. F. Nied
中科院分区:
文献类型:
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作者:
A. Ayhan;H. F. Nied
A technique for calculation of stress intensity factors for three-dimensional interface surface crack problems is presented. Of special interest, is the analysis of interface delamination observed in electronic packaging subjected to thermal cycling. Using a finite element approach, enriched 3-D interface crack tip elements are developed for direct computation of stress intensity factors along the crack front. The enriched 3-D crack tip elements contain the asymptotic displacement and strain fields for interface cracks. For cracks located between silicon and polymeric underfill materials in electronic packaging, the mode I and mode II stress intensity factors can be strongly coupled, since these materials yield relatively large values for Dunders' parameters. It is demonstrated that the enriched interface crack tip element approach is a very efficient technique for obtaining stress intensity factors and strain energy release rates for general three-dimensional interface crack problems. Of particular interest in this study are the stress intensity factors for semi-circular and quarter-circular surface cracks on the interface between silicon and epoxy. The enriched element approach is particularly effective for obtaining mode I, II and III stress intensity factors in the small zone near the free surface where the strength of the stress singularity is known to change.