Improving the formation and protective properties of silane films by the combined use of electrodeposition and nanoparticles incorporation
Improving the formation and protective properties of silane films by the combined use of electrodeposition and nanoparticles incorporation
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DOI：
10.1016/j.electacta.2006.05.034
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发表时间：
2006-10
影响因子：
6.6
通讯作者：
Liang Liu;Ji-Ming Hu;Jian-qing Zhang;C. Cao
中科院分区：
文献类型：
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作者：
Liang Liu;Ji-Ming Hu;Jian-qing Zhang;C. Cao
采用电沉积和纳米SiO2掺杂相结合的方法，以硅烷溶胶-凝胶体系为原料，在铝基体上制备了十二烷基三甲氧基硅烷/SiO2复合薄膜。结果表明，两种工艺均能提高成膜性和保护性能。研究了沉积电位和硅烷溶液中二氧化硅含量对沉积的影响。发现了一个“临界沉积电位”和一个“临界二氧化硅含量”，在此条件下所制得的硅烷膜具有最高的保护性能。薄膜厚度的增强已被检测到通过这两种技术从硅烷膜的元素深度分布，通过二次离子质谱（西姆斯）测量。在铝电极上在线记录硅烷溶液中的电流-时间曲线。与空白溶液相比，含二氧化硅前驱体中的电流响应较大，可能表明二氧化硅颗粒参与了膜的沉积。
The electrodeposition and nano-silica incorporation were used together to prepare the novel composite dodecyltrimethoxysilane/SiO2thin films from silane sol–gel system on aluminum substrate. The results showed that both the two techniques can improve the films formation and their protectiveness. The influences of the deposition potential and the silica content in silane solution were investigated. A “critical deposition potential” and a “critical silica content” were both observed, under which the obtained silane films had the highest protective properties. The enhancement in film thickness has been detected by these two techniques from the elemental depth profiles of silane films as measured by secondary-ion mass spectroscopy (SIMS). Current–time curves were on-line recorded on aluminum electrodes in silane solutions. As compared with that in blank solution, the current response was found to be larger in silica-contained precursor, probably suggesting that the silica particles participate in the film deposition.