All Amorphous Oxide Bipolar Heterojunction Diodes from Abundant Metals
All Amorphous Oxide Bipolar Heterojunction Diodes from Abundant Metals
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DOI:
10.1002/aelm.201400023
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发表时间:
2015-02
影响因子:
6.2
通讯作者:
P. Schlupp;F. Schein;H. von Wenckstern;M. Grundmann
中科院分区:
文献类型:
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作者:
P. Schlupp;F. Schein;H. von Wenckstern;M. Grundmann
DOI: 10.1002/aelm.201400023 Room-temperature (RT) fabrication of semiconducting thin fi lms has several signifi cant advantages. Among those is the usability of thermally unstable but fl exible substrates as well as the low energy consumption during fabrication. Despite their amorphous structure oxides consisting of metal cations having the electronic confi guration ( n − 1)d 10 n s 0 ( n > 3) show a high n-type conductivity and RT electron mobility in the order of 10 cm 2 V −1 s −1 . This is due to the conduction band minimum forming spherical s -orbitals of these cations which are insensitive to small deviations in bonding angle that occur in the amorphous state. [ 1 ] Typically these materials are compound oxides of gallium, indium, zinc, and tin. However, besides such n-type amorphous oxide semiconductors (AOS) also RT fabricated p-type semiconductors are needed to create bipolar devices. Spinel oxide compounds consisting of zinc and cobalt, iridium, or rhodium are some of the rare p -conducting AOS. Using the Risk list 2012 for metals published by the British Geological Survey and their prices we discuss here relevant AOS for a utilization in bipolar diodes. Furthermore we demonstrate a RT fabricated all amorphous oxide pn -heterojunction diode consisting of zinc-tin-oxide (ZTO) and zinc-cobalt-oxide (ZCO). To enhance the current rectifi cation an ultrathin semi-insulating zinc-tin-oxide layer was introduced at the hetero interface. [ 2 ]