Advances in thick and thin film analysis using interferometry
Advances in thick and thin film analysis using interferometry
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DOI：
10.1016/j.wear.2008.04.079
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发表时间：
2009-03-15
期刊：
影响因子：
5
通讯作者：
Conroy, M.
中科院分区：
文献类型：
--
作者：
Conroy, M.
随着对测量的理解变得越来越广泛，使用干涉测量法来测量透明和半透明膜变得越来越重要。使用干涉测量法测量1 μ m或更厚的厚膜的技术已经有一段时间了，但是使用干涉测量法测量薄膜是一种更新得多的技术，而且膜涂层对干涉测量法测量的影响一般现在正变得更广泛地被理解。本文讨论了用干涉法测量厚膜和薄膜的方法。(C)2008 Elsevier B.V.保留所有权利。
The use of interferometry to measure transparent and semi-transparent films is becoming more and more important as understanding of the measurement becomes more widespread. Techniques for measurement of thick films of 1 mu m or greater using interferometry have been available for some time but measurement of thin films using interferometry is a much newer technique, also the effect of films coatings on interferometry measurements in general is now becoming more widely understood. The measurement of thick and thin films using interferometry is discussed in this paper. (C) 2008 Elsevier B.V. All rights reserved.