Collective focusing of an intense pulsed ion beam
Collective focusing of an intense pulsed ion beam
复制标题
强脉冲离子束的集体聚焦
DOI：
10.1063/1.866182
复制
发表时间：
1987
影响因子：
4.6
通讯作者：
J. Moschella
中科院分区：
文献类型：
--
作者：
R. Kraft;B. Kusse;J. Moschella
在准中性和对施加的螺线管磁场的小扰动的假设下，演示了注入螺线管磁场区域的中和的强脉冲离子束的集体聚焦。观察到焦点出现在螺线管磁场内，并且位于单粒子电子和离子焦点之间的位置。聚焦束电流密度比入射束的 20 A/cm2 高一个数量级。实验结果与在上述假设下建立的理论模型非常吻合。观察到背景等离子体或导电衬垫的存在消除了集体聚焦，证实了理论模型的物理图像。
Under the assumptions of quasineutrality and small perturbation to the applied solenoidal magnetic field, collective focusing of a neutralized, intense pulsed ion beam injected into a solenoidal magnetic field region is demonstrated. The focal point was observed to occur within the solenoidal magnetic field and was at a location in between the single‐particle electron and ion focal points. The focused beam current density was an order of magnitude above the 20 A/cm2 of the incident beam. The experimental results were found to be in good agreement with a theoretical model developed under the above assumptions. The presence of background plasma or a conducting liner was observed to remove the collective focusing, confirming the physical picture of the theoretical model.