Thermopower Modulation Analyses of High-Mobility Transparent Amorphous Oxide Semiconductor Thin-Film Transistors
Thermopower Modulation Analyses of High-Mobility Transparent Amorphous Oxide Semiconductor Thin-Film Transistors
复制标题
高迁移率透明非晶氧化物半导体薄膜晶体管的热功率调制分析
DOI:
10.1021/acsaelm.2c01210
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发表时间:
2022
影响因子:
4.7
通讯作者:
Ohta Hiromichi
中科院分区:
文献类型:
--
作者:
Yang Hui;Zhang Yuqiao;Matsuo Yasutaka;Magari Yusaku;Ohta Hiromichi
Transparent amorphous oxide semiconductor InSnZnOx(ITZO)-based thin-film transistors (TFTs) exhibit a high field-effect mobility (μFE). Although ITZO-TFTs have attracted increasing attention as a next-generation backplane of flat panel displays, the origin of the high μFEremains unclear due to the lack of systematic quantitative analyses using thermopower (S) as the measure. Here, we show that the high μFEoriginates from an extremely light carrier effective mass (m*) and a long carrier relaxation time (τ). TheSmeasurements of several ITZO films with different carrier concentrations clarified thatm* of ITZO films is ∼0.11m0, which is ∼70% of that of a commercial oxide semiconductor, amorphous InGaZnO4(∼0.16m0). We then fabricated bottom-gate-top-contact ITZO-TFTs displaying excellent transistor characteristics (μFE∼ 58 cm2V–1s–1) using amorphous AlOxas the gate insulator and demonstrated that the effective thickness increases with the gate voltage. This suggests that the bulk predominantly contributes to the drain current, which results in τ as long as ∼3.6 fs, which is quadruple that of amorphous InGaZnO4-TFTs (∼0.9 fs). The present results are useful to further improve the mobility of ITZO-TFTs.