Theoretical fabrication of subwavelength structures by surface plasmon interference based on complementary grating
Theoretical fabrication of subwavelength structures by surface plasmon interference based on complementary grating
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基于互补光栅的表面等离子体干涉亚波长结构的理论制造
DOI：
10.1142/s0217984921505539
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发表时间：
2022-01
影响因子：
1.9
通讯作者：
Xiaolei Wen
中科院分区：
文献类型：
--
作者：
Xiangxian Wang;Yaqian Ren;Tianxu Jia;Yingwen Su;Yunping Qi;Xiaolei Wen
本文提出了一种基于互补光栅的表面等离子体干涉光刻技术，该技术包括硅光栅和互补铝光栅掩模，用于制造亚波长结构。在这项理论研究中，利用反射光谱确定了互补光栅结构的最佳参数。利用时域有限差分法和旋转相关公式获得了一维和二维亚波长结构的光场分布。数值评估结果表明，可以制造半节距分辨率为60.5nm（近似[公式：见正文]/6.7）的一维周期结构。此外，亚波长结构可以使用不同的旋转方法来曝光光刻样品，例如方点阵列和准六边形密堆积结构。该方法将表面等离子体干扰与样品旋转相结合，从而能够制造丰富的亚波长结构。
This paper presents a surface plasmon interference lithography technique based on the complementary grating, which comprises silicon gratings and complementary aluminum grating masks, for fabricating subwavelength structures. In this theoretical study, the optimal parameters of the complementary grating structure were determined using the reflectance spectrum. The optical field distributions of one- and two-dimensional subwavelength structures were obtained using the finite-difference time-domain method and rotation-related formulas. The results of numerical evaluations show that a one-dimensional periodic structure with a half-pitch resolution of 60.5nm (approximately [Formula: see text]/6.7) can be fabricated. In addition, subwavelength structures can be diversified using different rotation methods to expose the photolithography samples, such as square dot arrays and quasi-hexagonal closely packed structures. The proposed method combines surface plasmon interference with sample rotation, thereby enabling fabrication of abundant subwavelength structures.