Investigation of target state by plasma emission and target voltage measurements for reactive sputtering of Ni oxide thin films with water vapor injection
Investigation of target state by plasma emission and target voltage measurements for reactive sputtering of Ni oxide thin films with water vapor injection
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通过等离子体发射和水蒸气注入反应溅射镍氧化物薄膜的靶电压测量来研究靶状态
DOI：
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发表时间：
2018
期刊：
影响因子：
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通讯作者：
Takayuki Kiba
中科院分区：
文献类型：
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作者：
Yuki Yokoiwa;Yoshio Abe;Midori Kawamura;Kyung Ho Kim;Takayuki Kiba
