Sputtering of Au by 45‐keV ions for different fluences
Sputtering of Au by 45‐keV ions for different fluences
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不同能量密度下 45 keV 离子溅射 Au
DOI：
10.1063/1.88877
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发表时间：
1976
影响因子：
4
通讯作者：
E. P. Eernisse
中科院分区：
文献类型：
--
作者：
E. P. Eernisse
测量结果显示了用 45 keV 离子和 Zion 轰击的多晶 Au 的绝对溅射系数 S，其范围为 2 至 79。化学蚀刻 Au 表面获得的低注量结果代表了在几乎理想的离子注量和未损坏靶表面的近乎理想溅射条件下获得的第一组完整 S 值。结果明确证实了 S 随 Zion 的平滑单调增加，正如溅射理论所预测的那样。还获得了代表植入目标表面条件的高通量结果。这些结果显示了 S 随 Zion 的周期性变化，如过去的溅射研究中所见。
Measurements are presented of absolute sputtering coefficients S for polycrystalline Au bombarded by 45‐keV ions with Zion ranging from 2 to 79. Low‐fluence results taken with chemically etched Au surfaces represent the first complete set of S values taken under the nearly ideal sputtering conditions of vanishingly small ion fluence and undamaged target surface. The results confirm unambiguously the smooth monotonic increase in S with Zion as predicted by sputtering theory. High‐fluence results are also obtained which are representative of implanted‐target surface conditions. These results exhibit the periodic variation of S with Zion as seen in past sputtering investigations.