Atom probe tomography today
Atom probe tomography today
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DOI：
10.1016/s1369-7021(07)70306-1
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发表时间：
2007-12-01
期刊：
影响因子：
24.2
通讯作者：
Alvis, Roger L.
中科院分区：
文献类型：
--
作者：
Cerezo, Alfred;Clifton, Peter H.;Alvis, Roger L.
这篇评论的目的是描述和说明原子探针层析成像的应用，已成为可能的最新发展，特别是在试样制备技术（使用双束聚焦离子束仪器），但也更常规的使用激光脉冲的进展。这两个发展的结合，现在允许原子尺度的调查特定区域内的工程合金（例如，在晶界和裂纹附近），也是原子级的表征界面的多层膜，氧化膜，半导体材料和设备。
This review aims to describe and illustrate the advances in the application of atom probe tomography that have been made possible by recent developments, particularly in specimen preparation techniques (using dual-beam focused-ion beam instruments) but also of the more routine use of laser pulsing. The combination of these two developments now permits atomic-scale investigation of site-specific regions within engineering alloys (e.g. at grain boundaries and in the vicinity of cracks) and also the atomic-level characterization of interfaces in multilayers, oxide films, and semiconductor materials and devices.