Influence of thermal annealing on electrical and optical properties of indium tin oxide thin films
Influence of thermal annealing on electrical and optical properties of indium tin oxide thin films
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热退火对氧化铟锡薄膜电学和光学性能的影响
DOI:
10.1016/j.mssp.2014.05.026
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发表时间:
2014-10-01
影响因子:
4.1
通讯作者:
Zheng, Youdou
中科院分区:
文献类型:
--
作者:
Xu, Zhou;Chen, Peng;Zheng, Youdou
Transparent conducting indium tin oxide (ITO) thin films with the thickness of 300 nm were deposited on quartz substrates via electron beam evaporation, and five of them post-annealed in air atmosphere for 10 min at five selected temperature points from 200 degrees C to 600 degrees C, respectively. An UV-vis spectrophotometer and Hall measurement system were adopted to characterize the ITO thin films. Influence of thermal annealing in air atmosphere on electrical and optical properties was investigated in detail. The sheet resistance reached the minimum of 6.67 Omega/sq after annealed at 300 degrees C. It increased dramatically at even higher annealing temperature. The mean transmittance over the range from 400 nm to 800 nm reached the maximum of 89.03% after annealed at 400 degrees C, and the figure of merit reached the maximum of 17.79 (Unit: 10(-3) Omega(-1)) under the same annealing condition. With the annealing temperature increased from 400 degrees C to 600 degrees C, the variations of transmittance were negligible, but the figure of merit decreased significantly due to the deterioration of electrical conductivity. With increasing the annealing temperature, the absorption edge shifted towards longer wavelength. It could be explained on the basis of Burstein-Moss shift. The values of optical band gap varied in the range of 3.866-4.392 eV. (C) 2014 Elsevier Ltd. All rights reserved.