Investigation of low-pressure cold-sprayed particle deposition on low-temperature plasma-treated substrate
Investigation of low-pressure cold-sprayed particle deposition on low-temperature plasma-treated substrate
复制标题
低温等离子体处理基材上低压冷喷涂颗粒沉积的研究
DOI:
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发表时间:
2022
期刊:
影响因子:
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通讯作者:
Kazuhiro Ogawa
中科院分区:
文献类型:
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作者:
Hiroki Saito;Yuji Ichikawa;Kazuhiro Ogawa