Electron probe microanalysis (EPMA) measurement of thin-film thickness in the nanometre range
Electron probe microanalysis (EPMA) measurement of thin-film thickness in the nanometre range
复制标题
电子探针微量分析 (EPMA) 测量纳米范围内的薄膜厚度
DOI：
10.1007/s00216-002-1514-5
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发表时间：
2002
影响因子：
4.3
通讯作者：
W. Frank
中科院分区：
文献类型：
--
作者：
M. Procop;M. Radtke;M. Krumrey;K. Hasche;S. Schädlich;W. Frank
摘要。利用商业软件STRATAGEM计算薄膜厚度，用EPMA法测定了熔融二氧化硅和硅衬底上铂和镍薄膜的厚度。薄膜厚度约为10 nm。通过与其他分析方法的结果进行比较，试图估计该方法的置信范围。数据表明，除了光谱强度测量的不确定性和复杂的拟合程序外，还应考虑底层模型引起的系统偏差。其他方法得到的结果中的散射不能确定不确定范围，但估计与实际厚度的偏差小于20%。
Abstract. The thickness of thin films of platinum and nickel on fused silica and silicon substrates has been determined by EPMA using the commercial software STRATAGEM for calculation of film thickness. Film thickness ranged in the order 10 nm. An attempt was made to estimate the confidence range of the method by comparison with results from other methods of analysis. The data show that in addition to the uncertainty of the spectral intensity measurement and the complicated fitting routine, systematic deviation caused by the underlying model should be added. The scattering in the results from other methods does not enable specification of a range of uncertainty, but deviations from the real thickness are estimated to be less than 20%.