Investigation of the composition-structure-property relationship of AsxTe100-x films prepared by plasma deposition
Investigation of the composition-structure-property relationship of AsxTe100-x films prepared by plasma deposition
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DOI：
10.1016/j.saa.2017.10.038
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发表时间：
2018-02-15
影响因子：
4.4
通讯作者：
Gogova, Daniela
中科院分区：
文献类型：
--
作者：
Mochalov, Leonid;Dorosz, Dominik;Gogova, Daniela
采用等离子体增强化学气相沉积（PECVD）技术制备了不同化学含量的AsxTe100 - x非晶薄膜。首次在 UV-VIS-IR 范围（0.2 至 25 μm）内测量了各种化学成分（20-80 at.% As）的 As-Te 硫族化物材料的光学特性。 As-Te 薄膜已从 0.80 eV 调整至 1.10 eV。获得的红外结果与拉曼光谱结果并列，以确定所开发材料的光学和结构特性之间的相关性。激光照射表面退火下 As-Te 薄膜相组成的可逆和不可逆变化已经得到论证和研究。为了确定所制备的 As-Te 薄膜的潜在应用领域，还研究了热敏性和光敏性。 (C) 2017 Elsevier B.V. 保留所有权利。
AsxTe100 - x amorphous films of different chemical content were prepared by Plasma-Enhanced Chemical Vapor Deposition (PECVD). For the first time the optical properties of As-Te chalcogenide materials have been measured in UV-VIS-IR ranges (from 0.2 to 25 mu m) for a very wide range of chemical compositions (20-80 at.% As). As-Te films have been tuned from 0.80 to 1.10 eV. The IR results obtained have been juxtaposed with the Raman spectroscopy findings to establish the correlation between optical and structural properties of the materials developed. Reversible and irreversible changes in the phase composition of the As-Te films under annealing of the surface by laser irradiation have been demonstrated and studied. In order to determine the potential areas of application of the prepared As-Te films the thermal and photo sensitivity has been also investigated. (C) 2017 Elsevier B.V. All rights reserved.