Infrared studies of reactions on oxide surfaces. IV. Structure of chemisorbed ammonia on silica
Infrared studies of reactions on oxide surfaces. IV. Structure of chemisorbed ammonia on silica
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氧化物表面反应的红外研究。
DOI：
10.1021/j100589a012
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发表时间：
1975
期刊：
影响因子：
--
通讯作者：
L. Lee
中科院分区：
文献类型：
--
作者：
B. Morrow;I. A. Cody;L. Lee
结果尽管氨不与羟基化二氧化硅反应，但已知如果二氧化硅在超过400 ℃的温度下进行预先的真空脱气，则在20 ℃下确实发生化学吸附。1~ 3在3540、3450和1550 cm-1附近观察到了归属于这种新表面物种的红外谱带。这种反应的性质相当复杂，将在第五部分讨论。
ResultsAlthough ammonia does not react with hydroxylated sili-ca, it is known that chemisorption does occur at 20 C if the silica had been subjected to a prior vacuum degassing at temperatures in excess of 400 C. 1~ 3 Infrared bands which have been attributed to this new surface species are observed near 3540, 3450, and 1550 cm-1. The nature of this reaction is quite complex and will be discussed in part V.