Electrochemical imprint lithography on Si surface using a patterned polymer electrolyte membrane
Electrochemical imprint lithography on Si surface using a patterned polymer electrolyte membrane
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DOI：
10.1016/j.matchemphys.2020.124081
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发表时间：
2021-02
影响因子：
4.6
通讯作者：
Ryohei Umezaki;J. Murata
中科院分区：
文献类型：
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作者：
Ryohei Umezaki;J. Murata
良好定义的表面图案可用于改善表面特性、光学特性和润湿性。电化学压印光刻技术是一种很有前途的低成本材料表面微/纳米结构工艺。然而，这种方法通常需要大量的电解质和复杂的电化学设置。在此，我们提出了一种新的无液体电解质电化学压印光刻方法，涉及使用图图化的Nafion聚合物电解质膜。在该方法中，通过液体-无电解质电化学方法选择性氧化与图案化Nafion膜接触的Si材料表面。用HF浸渍法去除氧化膜后，在Si表面可获得宽度为70 ~ 170 μm、深度为40 nm的图像化结构。蚀刻深度随电解时间成比例增加。电解过程中，在硅表面和Nafion膜之间存在液态电解质，增加了硅表面形成的图案的宽度。这表明，与使用液体电解质的电化学方法相比，无液体电解质的电化学方法可以在Si表面上实现更精确的图案转换。采用该方法可以在室温下制备点状、六边形和点阵图案的Si表面。本文提出的无液体电解质电化学压印方法是一种简单、环保的直接压印工艺，可用于硬稳定材料的微图案和表面功能化。
Well-defined surface patterns can be applied to improve surface characteristics, optical properties, and wettability. Electrochemical imprint lithography is a promising method for fabricating micro/nanostructural patterns on material surfaces through low-cost procedures. However, this method typically requires a large amount of electrolyte and a complex electrochemical setup. Herein, we present a novel liquid-electrolyte-free electrochemical imprint lithography method involving the use of a patterned Nafion polymer electrolyte membrane. In this method, the Si material surface in contact with the patterned Nafion membrane is selectively oxidized through a liquid-electrolyte-free electrochemical method. Following the removal of the resulting oxide film by HF dipping, patterned structures with a width of 70–170 μm and a depth of 40 nm can be obtained on the Si surface. The etching depth increases proportionally with the electrolysis time. The presence of a liquid electrolyte between the Si surface and the Nafion membrane during electrolysis increases the width of the pattern formed on the Si surface. This indicates that the liquid-electrolyte-free electrochemical method facilitates more accurate pattern transformation on the Si surface than that involving the use of a liquid electrolyte. The dotted, hexagonal, and lattice patterned Si surfaces can be fabricated at room temperature by using the proposed method. The proposed liquid-electrolyte-free electrochemical imprint lithography method involving the use of a patterned Nafion membrane is a simple, environment-friendly direct imprinting process that can be applied for micropatterning on and surface functionalization of hard and stable materials.