Radon and thoron progeny integrated measurement based on high-voltage sampling
Radon and thoron progeny integrated measurement based on high-voltage sampling
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基于高压采样的氡气和钍气子体综合测量
DOI：
10.1080/00223131.2016.1179137
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发表时间：
2016-05
影响因子：
1.2
通讯作者：
Guo L
中科院分区：
文献类型：
--
作者：
Guo Lu;Guo Qiuju;Guo Lu;Meisenberg Oliver;Tschiersch Jochen;Schmidt Volkmar;Meisenberg Oliver;Guo L;Guo L
摘要是为了直接测量ra和Thoron后代浓度，同时采用了两种DIF，可以改善电场中无人值守的电池式后代测量（UBPM）设备，该设备可改善电场中的气溶胶颗粒
ABSTRACT For the purpose of directly measuring radon and thoron progeny concentrations simultaneously, an unattended battery-operated progeny measurement (UBPM) device, which samples aerosol particles in an electric field, was improved by adopting two different thickness aluminum foils for alpha particles discriminating. The equations for the calculation of the results were derived, and a series of calibration experiments and comparison tests were carried out in the potential alpha energy concentration calibration chamber in BfS Berlin and the HMGU experimental thoron house, respectively. Results show that the calibration coefficients are stable in different levels of radon and thoron progeny. The lower level detection limits of the device for radon and thoron progeny concentration are 1.22 and 0.14 Bq m−3, respectively, for three months exposure. The instrument proved to be independent from environmental conditions in ordinary living room conditions (humidity <65% RH, aerosol particle concentration >1500 cm−1). Comparison results show that the measurement results of the UBPM device are comparable with the reference instrument and suitable for long-term radon and thoron survey in dwellings.
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影响因子：
1.6
作者：
Lei Zhang;Q. Guo;Shanqiang Wang
通讯作者：
Lei Zhang;Q. Guo;Shanqiang Wang
DOI：
10.1063/1.4865163
发表时间：
2014-02
期刊：
The Review of scientific instruments
影响因子：
--
作者：
S. Gierl;O. Meisenberg;T. Haninger;M. Wielunski;J. Tschiersch
通讯作者：
S. Gierl;O. Meisenberg;T. Haninger;M. Wielunski;J. Tschiersch
影响因子：
0.5
作者：
P. Hamel;V. Schmidt
通讯作者：
P. Hamel;V. Schmidt
影响因子：
1
作者：
Kavasi, N.;Nemeth, Cs.;Somlai, J.
通讯作者：
Somlai, J.
影响因子：
1
作者：
L. Bi;Jochen Tschiersch;O. Meisenberg;M. Wielunski;Junli Li;B. Shang
通讯作者：
L. Bi;Jochen Tschiersch;O. Meisenberg;M. Wielunski;Junli Li;B. Shang