DEPOSITION UNIFORMITY OF PULSED VACUUM ARC ION SOURCE
DEPOSITION UNIFORMITY OF PULSED VACUUM ARC ION SOURCE
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DOI:
10.1016/b978-008044504-5/50007-6
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发表时间:
2005
期刊:
影响因子:
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通讯作者:
Cai Changlong;Mi Qian;Ma Weihong;Wu Lingling;Yan Yixin;Diao Dongfeng
中科院分区:
文献类型:
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作者:
Cai Changlong;Mi Qian;Ma Weihong;Wu Lingling;Yan Yixin;Diao Dongfeng