AN ESCA STUDY OF THE INTERACTION OF OXYGEN WITH THE SURFACE OF RUTHENIUM
AN ESCA STUDY OF THE INTERACTION OF OXYGEN WITH THE SURFACE OF RUTHENIUM
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DOI：
10.1016/0169-4332(91)90061-n
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发表时间：
1991-07-01
影响因子：
6.7
通讯作者：
KALIAGUINE, S
中科院分区：
文献类型：
--
作者：
SHEN, JY;ADNOT, A;KALIAGUINE, S
通过电子能谱化学分析（ESCA）研究了在室温至600℃范围内氧与钌（Ru）晶片表面的相互作用。记录了Ru 3d、3p、MVV、价带和O 1s光谱。在Ru晶片表面观察到三种不同的氧状态。根据氧的光电子发射光谱中的多重态结构以及各种氧状态的结合能，确定了三种状态中的两种。所确定的氧物种为O₂⁻和溶解的原子氧。在O 1s光谱中结合能为532.3 eV以及在光电子发射光谱中为11.7 eV处产生峰的第三种氧状态暂归为化学吸附的氢过氧自由基。还对Ru的氧化过程进行了讨论。
The interaction of oxygen with the surface of a Ru wafer in the range of room temperature to 600-degrees-C was investigated by ESCA. Ru3d,3p,MVV, valence band and O1s spectra were recorded. Three different states of oxygen were observed on the Ru wafer surface. Definitive identification of two of the three states was achieved according to the multiplet structure in the photoemission spectra of oxygen and the binding energy of various states of oxygen. The oxygen species identified are O2- and dissolved atomic oxygen. The third oxygen state which gives rise to the peak at a BE of 532.3 eV in the O1s spectrum and 11.7 eV in the photoemission spectrum is tentatively assigned to a chemisorbed hydroperoxy radical. A discussion of the Ru oxidation process is also given.