The effect of crystallographic misorientation and interfacial separation on jump-to-contact behavior and defect generation in aluminum
The effect of crystallographic misorientation and interfacial separation on jump-to-contact behavior and defect generation in aluminum
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DOI：
10.1088/1361-651x/aac427
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发表时间：
2018-05
影响因子：
1.8
通讯作者：
Milad Khajehvand;Panthea Sepehrband
中科院分区：
文献类型：
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作者：
Milad Khajehvand;Panthea Sepehrband
用分子动力学模拟方法研究了室温下铝中(111)取向表面的跳跃接触现象。研究了晶向偏差和界面距离对界面缺陷的JC行为和分布的影响。取向偏差对JC临界距离的影响可以忽略不计。然而，当JC发生时，对于不同的取向角，观察到不同的缺陷分布。对于低取向角，缺陷密度是界面距离的函数，而对于∼30±10°的错向角，缺陷密度与界面距离无关。
The jump-to-contact (JC) phenomenon for (111)-oriented surfaces in aluminum at room temperature is studied via molecular dynamics simulations. The effect of crystallographic misorientation and interfacial distance on the JC behavior and distribution of the resultant defects at the interface is investigated. The effect of misorientation on the critical distance for JC is found to be negligible. However, when JC occurs, different distribution of defects is observed for various misorientation angles. The density of defects is shown to be a function of interfacial distance for low misorientation angles, but independent of it for misorientation angles of ∼30 ± 10°.