Non-thermal Effect of Atmospheric-Pressure RF Cold Plasma on Photocatalytic Activity of As-deposited TiO2 Film
Non-thermal Effect of Atmospheric-Pressure RF Cold Plasma on Photocatalytic Activity of As-deposited TiO2 Film
复制标题
大气压射频冷等离子体对沉积态 TiO2 薄膜光催化活性的非热效应
DOI：
10.1002/cvde.201106939
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发表时间：
2012-06-01
影响因子：
--
通讯作者：
Zhu, Ai-Min
中科院分区：
文献类型：
--
作者：
Chang, Da-Lei;Li, Xiao-Song;Zhu, Ai-Min
以四异丙醇钛（TTIP）和O2为前驱体，采用常压（AP）、射频（RF）、介质阻挡放电（DBD）等离子体在低功率下沉积TiO2薄膜。利用扫描电子显微镜（SEM）、原子力显微镜（AFM）、紫外-可见（UV-vis）吸收光谱和拉曼光谱研究了TiO2薄膜的形貌、光学性能和晶体结构。所制备的TiO2薄膜在HCHO完全氧化为CO2和硬脂酸降解中表现出较高的光催化活性。RF-DBD等离子体中的气体温度估计约为500？K由旋转温度通过光学发射光谱（OES）。RF-DBD等离子体处理的非晶TiO2薄膜的实验结果进一步排除了等离子体对TiO2薄膜结晶产生热效应的可能性。证实了RF-DBD等离子体对沉积TiO2膜的高光催化活性的非热效应确实存在。
TiO2 film is deposited by atmospheric-pressure (AP), radio-frequency (RF), dielectric barrier discharge (DBD) plasma at a low power using titanium tetraisopropoxide (TTIP) and O2 as the precursors. The morphology, optical properties, and crystalline structure of the as-deposited TiO2 film are investigated by using scanning electron microscopy (SEM), atomic force microscopy (AFM), ultraviolet-visible (UV-vis) absorption spectroscopy, and Raman spectroscopy. The as-deposited TiO2 film show high photocatalytic activity in complete oxidation of HCHO to CO2 and degradation of stearic acid. The gas temperature in the RF-DBD plasma is estimated to be at about 500?K by the rotational temperature via optical emission spectroscopy (OES). The experimental results of amorphous TiO2 film treated by the RF-DBD plasma further exclude the likelihood of thermal effects derived from the plasma on crystallization of TiO2 film. It is confirmed that the non-thermal effect of the RF-DBD plasma on the high photocatalytic activity of the as-deposited TiO2 film does exist.