Overdense plasma production using electron cyclotron waves
Overdense plasma production using electron cyclotron waves
复制标题
使用电子回旋波产生高密度等离子体
DOI:
10.1143/jpsj.60.1600
复制
发表时间:
1991
影响因子:
1.7
通讯作者:
Y. Kawai
中科院分区:
文献类型:
--
作者:
Masayoshi Y. Tanaka;Ryuji Nishimoto;S. Higashi;N. Harada;T. Ohi;A. Komori;Y. Kawai
The density limit in ECR plasma production is overcome using electron cyclotron waves. The plasma of 3×10 13 cm -3 density is achieved by parallel injection of circularly polarized microwaves with a frequency 2.45 GHz, corresponding to a 400 times higher density than ordinary mode cutoff. It is found that the plasma is produced in the high field side region between the incident position and the ECR point, and this is due to the generation of high energy electrons and the Doppler-shifted cyclotron resonance.