Performance Test of Fresnel Zone Plate with 50 nm Outermost Zone Width in Hard X-ray Region
Performance Test of Fresnel Zone Plate with 50 nm Outermost Zone Width in Hard X-ray Region
复制标题
最外层带宽50 nm菲涅尔波带片在硬X射线区域的性能测试
DOI：
10.1143/jjap.44.1994
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发表时间：
2005
影响因子：
1.5
通讯作者：
H. Takenaka
中科院分区：
文献类型：
--
作者：
Yoshio Suzuki;A. Takeuchi;H. Takano;H. Takenaka
为了评价菲涅耳波带片光学系统的性能，进行了硬X射线微聚焦实验。用电子束光刻技术制作了最外区宽度为50 nm、厚度为0.5 μm的钽菲涅耳波带片。在8 keV的X射线能量下，对于一级衍射，通过刀口扫描测量的聚焦光束尺寸为58 nm的半峰全宽。可以得出结论，这种波带片在硬X射线区域具有接近衍射极限的分辨率。在8keV处测得的衍射效率为5%。使用波带片的三阶焦点的光斑尺寸被测量为约30 nm。
A microfocusing experiment for hard X-rays has been performed to evaluate the performance of Fresnel zone plate optics. A tantalum Fresnel zone plate with an outermost zone width of 50 nm and a thickness of 0.5 µm has been fabricated by electron-beam lithography. The focused beam size measured by a knife-edge scan is 58 nm in full-width at half-maximum for the first-order diffraction at an X-ray energy of 8 keV. It can be concluded that this zone plate has nearly diffraction-limited resolution in the hard X-ray region. The measured diffraction efficiency is 5% at 8 keV. The spot size using the third-order focus of the zone plate is measured to be approximately 30 nm.