Ultrasonic-assisted synthesis Zn0.78Cd0.22S/Bi2MoO6 heterojunction to improve photocatalytic performance for hexavalent chromium removal and hydrogen peroxide production
Ultrasonic-assisted synthesis Zn0.78Cd0.22S/Bi2MoO6 heterojunction to improve photocatalytic performance for hexavalent chromium removal and hydrogen peroxide production
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超声波辅助合成 Zn0.78Cd0.22S/Bi2MoO6 异质结以提高六价铬去除和过氧化氢生产的光催化性能
DOI:
10.1016/j.colsurfa.2022.129363
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发表时间:
2022-05
期刊:
影响因子:
--
通讯作者:
Xiaoheng Liu
中科院分区:
文献类型:
--
作者:
Yue Mao;Xiaoheng Liu
Due to the wide application of hydrogen peroxide, the demand for hydrogen peroxide is increasing day by day all over the world. However, the traditional preparation method of hydrogen peroxide has many inevitable disadvantages, such as high energy consumption, low yield, and the by-products during the reaction process have great harm to the environment. So, it is emergent to search for new efficient and environmentally friendly ways to produce hydrogen peroxide. The stable semiconductor Zn0.78Cd0.22S and bismuth-based material Bi2MoO6were combined to form heterojunction for the first time. The heterojunction photocatalyst Zn0.78Cd0.22S/Bi2MoO6is mainly applied to the treatment of heavy metal hexavalent chromium in wastewater and photocatalytic hydrogen peroxide production. The successful construction of heterojunction greatly reduces the recombination rate of photogenerated electrons and photogenerated holes, resulting in more electrons reducing oxygen to generate hydrogen peroxide and reducing Cr6+to Cr3+in the conduction band of Zn0.78Cd0.22S, and more photogenerated holes oxidizing water molecules to obtain hydrogen peroxide in the valence band of Bi2MoO6. Furthermore, compared with the hydrothermal method to combine Zn0.78Cd0.22S and Bi2MoO6, the ultrasonic method used here prevents the synthesis of Bi2S3.
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影响因子:
6.7
作者:
Yabin Jiang;Zongzhao Sun;Qianwen Chen;C. Cao;Yun Zhao;Wensheng Yang;Lei Zeng;Limin Huang
通讯作者:
Yabin Jiang;Zongzhao Sun;Qianwen Chen;C. Cao;Yun Zhao;Wensheng Yang;Lei Zeng;Limin Huang
影响因子:
5.8
作者:
Chunyan Du;Luyue Yang;Shiyang Tan;Jiahao Song;Zhuo Zhang;Shitao Wang;Ying Xiong;Guanlong Yu
通讯作者:
Chunyan Du;Luyue Yang;Shiyang Tan;Jiahao Song;Zhuo Zhang;Shitao Wang;Ying Xiong;Guanlong Yu
DOI:
10.1016/j.colsurfa.2020.124778
发表时间:
2020-10
期刊:
Colloids and Surfaces A: Physicochemical and Engineering Aspects
影响因子:
--
作者:
Min Zhang;Hongfei Yin;Jiacheng Yao;M. Arif;Bocheng Qiu;Pengyan Li;Xiaoheng Liu
通讯作者:
Min Zhang;Hongfei Yin;Jiacheng Yao;M. Arif;Bocheng Qiu;Pengyan Li;Xiaoheng Liu
影响因子:
8.6
作者:
C. Reddy;I. N. Reddy;K. Ravindranadh;K. R. Reddy;Dongseob Kim;J. Shim
通讯作者:
C. Reddy;I. N. Reddy;K. Ravindranadh;K. R. Reddy;Dongseob Kim;J. Shim
影响因子:
9.9
作者:
Huidong Shen;F. Fu;Wenwen Xue;Xiaoxia Yang;S. Ajmal;Yanzhong Zhen;Li Guo;Danjun Wang;R. Chi-R.
通讯作者:
Huidong Shen;F. Fu;Wenwen Xue;Xiaoxia Yang;S. Ajmal;Yanzhong Zhen;Li Guo;Danjun Wang;R. Chi-R.