Oxidation behaviour of TiAlN coatings sputtered at low temperature
Oxidation behaviour of TiAlN coatings sputtered at low temperature
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DOI：
10.1016/s0042-207x(98)00407-2
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发表时间：
1999-05-01
期刊：
影响因子：
4
通讯作者：
Zalar, A
中科院分区：
文献类型：
--
作者：
Panjan, P;Navinsek, B;Zalar, A
本文报道了低温溅射Ti_（1-x）Al_xN涂层的基本力学性能、结构性能和氧化行为。在Sputron（巴尔泽）等离子束溅射装置中在低于200 ℃的温度下溅射沉积四种不同组成的Ti 1-xAl xN涂层。抛光的工具钢盘、硅晶片和抛光的氧化铝陶瓷用作基底。通过在氧气气氛中在700-900摄氏度的温度下加热样品选定的时间来进行涂层的氧化。用扫描电子显微镜观察了沉积态和氧化态薄膜的表面形貌和断面形貌，用XRD和TEM分析了薄膜的结构。(C)1999爱思唯尔科技有限公司。保留所有权利。
The basic mechanical and structural properties, as well as the oxidation behaviour of Ti1-xAlxN coatings sputtered at low temperature are reported. Ti1-xAlxN coatings of four different compositions were sputter deposited in a Sputron (Balzers) plasma-beam sputtering apparatus at a temperature below 200 degrees C. Polished tool steel discs, silicon wafers and polished alumina ceramics were used as substrates. Oxidation of coatings was carried out by heating the samples at temperatures of 700-900 degrees C in an oxygen atmosphere for selected times. The surface and fracture cross-sectional morphology of the as-deposited and oxidized films were studied by scanning electron microscopy, while the structure of the coatings was examined by the XRD and TEM techniques. (C) 1999 Elsevier Science Ltd. All rights reserved.